Notes 

Chapter 1. Introduction and Historical Perspective

Part 1

Part II

Chapter 2. Modern CMOS Technology

Part I

 

Chapter 3. Crystal Growth, Wafer Fabrication and Basic Properties of Silicon Wafers

Part I

 

Chapter 4. Semiconductor Manufacturing - Clean Rooms, Wafer Cleaning, and Gettering

Part I

Part II

 

Chapter 5. Lithography

Part I

Part II

 

Chapter 6. Thermal Oxidation and the Si/SiO₂ Interface

Part I  

Chapter 7. Dopant Diffusion

Part I

Part II

 

Chapter 8. Ion Implantation

Part I

Part II

 

 Chapter 9. Thin Film Deposition

Part I

 

Chapter 10. Etching

Part I

 

Chapter 11. Back-End Processing

Part I